Hannah successfully defended her PhD last month! Hannah has been doing exciting research looking into W atomic layer deposition (ALD), WF6 and MoF6 chemical vapor etching (CVE), and TiO2 atomic layer etching (ALE) systems. She worked to create intricate nanoarchitectures in Si and TiO2 materials. Congratulations, Hannah! Good luck on your next adventure with microscopy at TEL!
