2019 and Earlier


289: Rahmanian, V.; Ebrahim, M. Z. A.; Razavi, S.; Abdelmigeed, M.; Barbieri, E.; Menegatti, S.; Parsons, G. N.; Li, F.; Pirzada, T.; Khan, S. A.

Vapor phase synthesis of metal-organic frameworks on a nanofibrous aerogel creates enhanced functionality

J. Mater. Chem. A 2023
DOI: 10.1039/d3ta05299k

288: McGuigan, S.; Tereniak, S. J.; Donley, C. L.; Smith, A.; Jeon, S.; Zhao, F.; Sampaio, R. N.; Pauly, M.; Keller, L.; Collins, L.; Parsons, G. N.; Lian, T.; Stach, E. A.; Maggard, P. A.

Discovery of a Hybrid System for Photocatalytic CO2 Reduction via Attachment of a Molecular Cobalt-Quaterpyridine Complex to a Crystalline Carbon Nitride

Adv. Mater. Interfaces 2023 
DOI: 10.1002/admi.202300163

287: Morgan, S. E.; Rivera, C. D.; Willis, M. L.; Peterson, G. W.; Mahle, J. J.; Mundy, L.; Parsons, G. N.

Factors and limitations of green, rapid MOF-fabric synthesis and effects on dual chemical warfare agent protection

Ind. Eng. Chem. Res. 2023 
DOI: 10.1021/acs.iecr.3c01282

286: Saare, H.; Xie, W. Y.; Parsons, G. N.

Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride

J. Vac. Sci. Technol. 2023 
DOI: 10.1116/6.0002708

285: Nye, R. A.; Van Dongen, K.; de Marneffe, J.; Parsons, G. N.; Delabie, A.

Quantified Uniformity and Selectivity of TiO2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition Supercycles

Adv. Mater. Interfaces 2023 
DOI: 10.1002/admi.202300163

284: Hsain, H. A.; Lee, Y.; Lomenzo, P. D.; Alcala, R.; Xu, B.; Mikolajick, T.; Schroeder, U.; Parsons, G. N.; Jones, J. L.

Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition

J. Appl. Phys. 2023 
DOI: 10.1063/5.0147124

283: Oh, H.; Kim, J. S.; Margavio, H. R. M.; Parsons, G. N. 

Self-Aligned Nanopatterning and Controlled Lateral Growth by Dual-Material Orthogonal Area-Selective Deposition of Poly(3,4-ethylenedioxythiophene) and Tungsten

Chem. Mater. 2023 
DOI: 10.1021/acs.chemmater.3c00530

282: Keller, N. D.; Vecchi, P.; Grills, D. C.; Polyansky, D. E.; Bein, G. P.; Dempsey, J. L.; Cahoon, J. F.; Parsons, G. N.; Sampaio, R. N.; Meyer, G. J.

Multi-Electron Transfer at H-Terminated p-Si Electrolyte Interfaces: Large Photovoltages under Inversion Conditions

J. Am. Chem. Soc. 2023 
DOI: 10.1021/jacs.3c01990

281: Clerix, J. J.; Dianat, G.; Delabie, A.; Parsons, G. N. 

In situ analysis of nucleation reactions during TiCl4/H2O atomic layer deposition on SiO2 and H-terminated Si surfaces treated with a silane small molecule inhibitor

J. Vac. Sci. 2023 
DOI: 10.1116/6.0002493

280: Hsain, H. A.; Lee, Y.; Lancaster, S.; Lomenzo, P. D.; Xu, B.; Mikolajick, T.; Schroeder, U.; Parsons, G. N.; Jones, J. L.

Reduced fatigue and leakage of ferroelectric TiN/Hf0.5Zr0.5O2/TiN capacitors by thin alumina interlayers at the top or bottom interface

Nanotechnology. 2023 
DOI: 10.1088/1361-6528/acad0a

279: Nye, R. A.; Van Dongen, K.; De Simone, D.; Oka, H.; Parsons, G. N.; Delabie, A.

Enhancing Performance and Function of Polymethacrylate Extreme Ultraviolet Resists Using Area-Selective Deposition

Chem. Mater. 2023
DOI: 10.1021/acs.chemmater.2c03404