Wenyi Xie Selected as Finalist for ALE 2018 Best Student Paper Award

The Parsons’ group has another student finalist at the 2018 ALD International Conference this summer! Wenyi’s paper titled “Self-limiting Thermal Atomic Layer Etching of Tungsten Metal Using O2 Oxidation and WCl6 or WF6: Role of Halogen Species in Temperature Dependence of ALE Reaction Rate” has been selected as a finalist for the ALE 2018 Best Student Paper Award. Check out more details about the conference and the competition here.

Congratulations and good luck Wenyi!