The Parsons’ group has another student finalist at the 2018 ALD International Conference this summer! Wenyi’s paper titled “Self-limiting Thermal Atomic Layer Etching of Tungsten Metal Using O2 Oxidation and WCl6 or WF6: Role of Halogen Species in Temperature Dependence of ALE Reaction Rate” has been selected as a finalist for the ALE 2018 Best Student Paper Award. Check out more details about the conference and the competition here.
Congratulations and good luck Wenyi!
