SK’s paper titled “Integrated Isothermal Atomic Layer Deposition and Thermal Atomic Layer Etching: “Atomic-Level Processing” for Area-Selective Patterning of TiO2” has been selected as a finalist for the ALD 2018 Best Student Paper Award. He will be giving an oral presentation on his work at the 2018 ALD International Conference this summer in Incheon, South Korea, after which the finalist will be selected. Learn more about the conference and the award here.
Congratulations and good luck SK!
