2024
| 2024 |
2023 |
2022 |
2021 |
2020 |
2019 and Earlier |
2024
 |
296: Margavio, H. R. M.; Arellano, N.; Singh, I.; Wojtecki, R.; Parsons, G. N.
Simultaneous Co-localized TiO2 Etching and W Atomic Layer Deposition Using WF6 as a Dual-Functional Reactant Chem. Mater. 2024 |
 |
295: Oyetade, O. A.; Wang, Y. Q.; He, S.; Margavio, H. R. M.; Bottum, S. R.; Rooney, C. L.; Wang, H. L.; Donley, C. L.; Parsons, G. N.; Cohen-Karni, T. Cahoon, J. F.
Covalent Functionalization of Silicon with Plasma-Grown “Fuzzy” Graphene: Robust Aqueous Photoelectrodes for CO2 Reduction by Molecular Catalysts ACS Appl. Mater. Interfaces 2024 |
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294: Oh, H.; Thelven, J. M.; Margavio, H. R. M.; Parsons, G. N.
Low-Temperature Dual-Material Area-Selective Deposition: Molybdenum Hexafluoride-Mediated SiO2 Fluorination/Passivation for Self-Aligned Molybdenum/Metal Oxide Nanoribbons Adv. Funct. Mater. 2024 |
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293: Nedzbala, H.; Westbroek, D.; Margavio, H. R. M.; Yang, H.; Noh, H.; Magpantay, S. V.; Donley, C. L.; Kumbhar, A. S.; Parsons, G. N.; Mayer, J. M.
Photo-Electrochemical Proton-Coupled Electron Transfer of TiO2 Thin Films on Silicon J. Am. Chem. Soc. 2024 |
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292: Carroll, N. M.; Margavio, H. R. M.; Parsons, G. N.
“Dual-Tone” Area-Selective Deposition: Selectivity Inversion of Polymer on Patterned Si/SiO2 Starting Surfaces. Chem. Mater. 2024 |
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291: Stone, D. M.; Morgan, S. E.; Abdelmigeed, M. O.; Nguyen, J.; Bennett, T. D.; Parsons, G. N.; Cowan, M. G.
Control of ZIF-62 and agZIF-62 Film Thickness within Asymmetric Tubular Supports though Pressure and Dose Time Variation of Atomic Layer Deposition Small 2024 |
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290: Nye, R. A.; Carroll, N. M.; Morgan, S. E.; Parsons, G. N.
Vapor-phase zeolitic imidazolate framework-8 growth on fibrous polymer substrates J. Vac. Sci. Technol. A 2024 |