2018
2023 |
2022 |
2021 |
2020 |
2019 |
2018 |
2017 |
2016 |
2015 |
2014 |
2013 |
2012 |
2011 |
2010 and Earlier |
2018
237: Lee, D. T.; Jamir, J. D.; Peterson, G. W.; Parsons, G. N.
Water-Stable Chemical-Protective Textiles viz Euhedral Surface-Oriented 2D Cu-TCPP Metal-Organic Frameworks Small. 2018 |
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236: Stevens, E. C.; Mousa, M. M.; Parsons, G. N.
Thermal Atomic Layer Deposition of Sn Metal Using SnCl4 and a Vapor Phase Silyl Dihydropyrazine Reducing Agent |
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235: King, M.X.; Theofanis, P.; Lemaire, P.C.; Santiso, E.; Parsons, G. N.
Ab initio Analysis of Nucleation Reactions during Tungsten Atomic Layer Deposition on Si(100) and W(110) Substrates Journal of Vacuum Science and Technology A. 2018 |
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234: Xie, W.; Khan, S. A.; Rojas, O. J.; Parsons, G. N.
Control of Micro- and Mesopores in Carbon Nanofibers and Hollow Carbon Nanofibers Derived from Cellulose Diacetate via Vapor Phase Infiltration of Diethyl Zinc |
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233: Cui, K.; Lemaire, P. C.; Zhao, H.; Savas, T.; Parsons, G. N.; Hart, A.J.
Tungsten-Carbon Nanotube Composite Photonic Crystals as Thermally Stable Spectral-Selective Absorbers and Emitters for Thermophotovoltaics |
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232: Dwyer, D.B.; Lee, D. T.; Boyer, S.; Bernier, W. E.; Parsons, G. N.; Jones, W. E.
Toxic Organophosphate Hydrolysis Using Nanofiber-Templated UiO-66-NH2 Metal–Organic Framework Polycrystalline Cylinders |
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231: Mousa, M. B. M.; Ovental, J. S.; Brozena, A. H.; Oldham, C. J.; Khan, S. A.; Parsons, G. N.
Modeling and Experimental Demonstration of High-Throughput Flow-Through Spatial Atomic Layer Deposition of Al2O3 Coatings on Textiles at Atmospheric Pressure |
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230: Stevens, E.; Tomczak, Y.; Chan, B. T.; Sanchez, E. A.; Parsons, G. N.; Delabie, A.
Area-Selective Atomic Layer Deposition of TiN, TiO2, and HfO2 on Silicon Nitride with inhibition on Amorphous Carbon |
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229: Barton, H. F.; Davis, A. K.; Lee, D. T.; Parsons, G. N.
Solvothermal Synthesis of MIL-96 and UiO-66-NH2 on Atomic Layer Deposited Metal Oxide Coatings on Fiber Mats JoVE. 2018 |
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228: Xie, W.; Lemaire, P.C.; Parsons, G. N.
Thermally Driven Self-Limiting Atomic Layer Etching of Metallic Tungsten Using WF6 and O2 |