Publications

2024
2023
2022
2021
2020
2019 and Earlier

2024

296: Margavio, H. R. M.; Arellano, N.; Singh, I.; Wojtecki, R.; Parsons, G. N.

Simultaneous Co-localized TiO2 Etching and W Atomic Layer Deposition Using WF6 as a Dual-Functional Reactant

Chem. Mater. 2024 
DOI: 10.1021/acs.chemmater.4c01773

295: Oyetade, O. A.; Wang, Y. Q.; He, S.; Margavio, H. R. M.; Bottum, S. R.; Rooney, C. L.; Wang, H. L.; Donley, C. L.; Parsons, G. N.; Cohen-Karni, T. Cahoon, J. F. 

Covalent Functionalization of Silicon with Plasma-Grown “Fuzzy” Graphene: Robust Aqueous Photoelectrodes for CO2 Reduction by Molecular Catalysts

ACS Appl. Mater. Interfaces 2024 
DOI: 10.1021/acsami.4c04691

294: Oh, H.; Thelven, J. M.; Margavio, H. R. M.; Parsons, G. N.

Low-Temperature Dual-Material Area-Selective Deposition: Molybdenum Hexafluoride-Mediated SiO2 Fluorination/Passivation for Self-Aligned Molybdenum/Metal Oxide Nanoribbons

Adv. Funct. Mater. 2024 
DOI: 10.1002/adfm.202316872

293: Nedzbala, H.; Westbroek, D.; Margavio, H. R. M.; Yang, H.; Noh, H.; Magpantay, S. V.; Donley, C. L.; Kumbhar, A. S.; Parsons, G. N.; Mayer, J. M. 

Photo-Electrochemical Proton-Coupled Electron Transfer of TiO2 Thin Films on Silicon

J. Am. Chem. Soc. 2024 
DOI: 10.1021/jacs.4c00014

292: Carroll, N. M.; Margavio, H. R. M.; Parsons, G. N.

“Dual-Tone” Area-Selective Deposition: Selectivity Inversion of Polymer on Patterned Si/SiO2 Starting Surfaces.

Chem. Mater. 2024 
DOI: 10.1021/acs.chemmater.3c03158

291: Stone, D. M.; Morgan, S. E.; Abdelmigeed, M. O.; Nguyen, J.; Bennett, T. D.; Parsons, G. N.; Cowan, M. G.

Control of ZIF-62 and agZIF-62 Film Thickness within Asymmetric Tubular Supports though Pressure and Dose Time Variation of Atomic Layer Deposition

Small 2024 
DOI: 10.1002/smll.202307202

290: Nye, R. A.; Carroll, N. M.; Morgan, S. E.; Parsons, G. N.

Vapor-phase zeolitic imidazolate framework-8 growth on fibrous polymer substrates

J. Vac. Sci. Technol. A 2024 
DOI: 10.1116/6.0003183

2023

289: Rahmanian, V.; Ebrahim, M. Z. A.; Razavi, S.; Abdelmigeed, M.; Barbieri, E.; Menegatti, S.; Parsons, G. N.; Li, F.; Pirzada, T.; Khan, S. A.

Vapor phase synthesis of metal-organic frameworks on a nanofibrous aerogel creates enhanced functionality

J. Mater. Chem. A 2023
DOI: 10.1039/d3ta05299k

288: McGuigan, S.; Tereniak, S. J.; Donley, C. L.; Smith, A.; Jeon, S.; Zhao, F.; Sampaio, R. N.; Pauly, M.; Keller, L.; Collins, L.; Parsons, G. N.; Lian, T.; Stach, E. A.; Maggard, P. A.

Discovery of a Hybrid System for Photocatalytic CO2 Reduction via Attachment of a Molecular Cobalt-Quaterpyridine Complex to a Crystalline Carbon Nitride

Adv. Mater. Interfaces 2023 
DOI: 10.1002/admi.202300163

287: Morgan, S. E.; Rivera, C. D.; Willis, M. L.; Peterson, G. W.; Mahle, J. J.; Mundy, L.; Parsons, G. N.

Factors and limitations of green, rapid MOF-fabric synthesis and effects on dual chemical warfare agent protection

Ind. Eng. Chem. Res. 2023 
DOI: 10.1021/acs.iecr.3c01282

286: Saare, H.; Xie, W. Y.; Parsons, G. N.

Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride

J. Vac. Sci. Technol. 2023 
DOI: 10.1116/6.0002708

285: Nye, R. A.; Van Dongen, K.; de Marneffe, J.; Parsons, G. N.; Delabie, A.

Quantified Uniformity and Selectivity of TiO2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition Supercycles

Adv. Mater. Interfaces 2023 
DOI: 10.1002/admi.202300163

284: Hsain, H. A.; Lee, Y.; Lomenzo, P. D.; Alcala, R.; Xu, B.; Mikolajick, T.; Schroeder, U.; Parsons, G. N.; Jones, J. L.

Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition

J. Appl. Phys. 2023 
DOI: 10.1063/5.0147124

283: Oh, H.; Kim, J. S.; Margavio, H. R. M.; Parsons, G. N. 

Self-Aligned Nanopatterning and Controlled Lateral Growth by Dual-Material Orthogonal Area-Selective Deposition of Poly(3,4-ethylenedioxythiophene) and Tungsten

Chem. Mater. 2023 
DOI: 10.1021/acs.chemmater.3c00530

282: Keller, N. D.; Vecchi, P.; Grills, D. C.; Polyansky, D. E.; Bein, G. P.; Dempsey, J. L.; Cahoon, J. F.; Parsons, G. N.; Sampaio, R. N.; Meyer, G. J.

Multi-Electron Transfer at H-Terminated p-Si Electrolyte Interfaces: Large Photovoltages under Inversion Conditions

J. Am. Chem. Soc. 2023 
DOI: 10.1021/jacs.3c01990

281: Clerix, J. J.; Dianat, G.; Delabie, A.; Parsons, G. N. 

In situ analysis of nucleation reactions during TiCl4/H2O atomic layer deposition on SiO2 and H-terminated Si surfaces treated with a silane small molecule inhibitor

J. Vac. Sci. 2023 
DOI: 10.1116/6.0002493

280: Hsain, H. A.; Lee, Y.; Lancaster, S.; Lomenzo, P. D.; Xu, B.; Mikolajick, T.; Schroeder, U.; Parsons, G. N.; Jones, J. L.

Reduced fatigue and leakage of ferroelectric TiN/Hf0.5Zr0.5O2/TiN capacitors by thin alumina interlayers at the top or bottom interface

Nanotechnology. 2023 
DOI: 10.1088/1361-6528/acad0a

279: Nye, R. A.; Van Dongen, K.; De Simone, D.; Oka, H.; Parsons, G. N.; Delabie, A.

Enhancing Performance and Function of Polymethacrylate Extreme Ultraviolet Resists Using Area-Selective Deposition

Chem. Mater. 2023
DOI: 10.1021/acs.chemmater.2c03404

2022

278: Lee, Y.; Broughton, R. A.; Hsain, H. A.; Song, S. K.; Edgington, P. G.; Horgan, M. D.; Dowden, A.; Bednar, A.; Lee, D. H.; Parsons, G. N.; Park, M. H.; Jones, J. L.

The influence of crystallographic texture on structural and electrical properties in ferroelectric Hf0.5Zr0.5O2

J. Appl. Phys. 2022 
DOI: 10.1063/5.0128038

277: Kim, J.; Oh, H.; Parsons, G. N.

Growth behavior and substrate selective deposition of polypyrrole, polythiophene, and polyaniline by oxidative chemical vapor deposition and molecular layer deposition

J. Vac. Sci. Technol A. 2022 
DOI: 10.1116/6.0002036

276: Morgan, S. E.; Willis, M. L.; Dianat, G.; Peterson, G. W.; Mahle, J. J.; Parsons, G. N.

Toxin-Blocking Textiles: Rapid, Benign, Roll-to-Roll Production of Robust MOF-Fabric Composites for Organophosphate Separation and Hydrolysis

ChemSusChem 2022 
DOI: 10.1002/cssc.202201744

275: Nye, R. A.; Van Dongen, K.; Oka, H.; De Simone, D.; Parsons, G. N.; Delabie, A.

Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO2 area-selective deposition

J. Micro/Nanopattern. Mater. Metrol. 2022 
DOI: 10.1117/1.JMM.21.4.041407

274: Hsain, H. A.; Lee, Y. H.; Lancaster, S.; Materano, M.; Alcala, R.; Xu, B. H.; Mikolajick, T.; Schroeder, U.; Parsons, G. N.; Jones, J. L.

Role of Oxygen Source on Buried Interfaces in Atomic-Layer Deposited Ferroelectric Hafnia-Zirconia Thin Films

ACS Appl. Mater. Interfaces 2022 
DOI: 10.1021/acsami.2c11073

273: Gu, H.; Lee, D. T.; Corkery, P.; Miao, Y.; Kim, S. K., Yuan, Y.; Xu, Z.; Dai, G.; Parsons, G. N.; Kevrekidis, I. G.; Zhuang, L.; Tsapatsis, M.

Modeling of deposit formation in mesoporous substrates via atomic layer deposition: Insights from pore-scale simulation

AIChE J 2022 
DOI: 10.1002/aic.17889

272: Nye, R. A.; Song, S. K.; Dongen, K. V.; Delabie, A.; Parsons, G. N.

Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition

Appl. Phys. Lett. 2022 
DOI: 10.1016/j.apmt.2022.101517

271: Wang, S. Y.; Pirzada, T.; Xie, W. Y.; Barbieri, E.; Hossian, O.; Opperman, C. H.; Pal, L.; Wei, Q. S.; Parsons, G. N.; Khan, S. A.

Creating hierarchically porous banana paper-metal organic framework (MOF) composites with multifunctionality

Appl. Mater. Today 2022 
DOI: 10.1016/j.apmt.2022.101517

270: Saare, H.; Dianat, G.; Parsons, G. N.

Comparative In Situ Study of the Initial Growth Trends of Atomic Layer-Deposited Al(2)O(3) Films

J. Phys. Chem. C. 2022
DOI: 10.1021/acs.jpcc.2c01033

269: Morgan, S.; Willis, M.; Peterson, G.; Mahle, J.; Parsons, G. N.

Green MOF-Fabrics: Benign, Scalable Sorption-Vapor Synthesis of Catalytic Composites to Protect against Phosphorus-Based Toxins

ACS Sustain. Chem. Eng. 2022 
DOI: 10.1021/acssuschemeng.1c07512

268: Hsain, H. A.; Lee, Y.; Materano, M.; Mittmann, T.; Payne, A.; Mikolajick, T.; Schroeder, U. Parsons, G. N.; Jones, J. L.

Many routes to ferroelectric HfO2: A review of current deposition methods

J. Vac. Sci. Technol. 2022 
DOI: 10.1116/6.0001317

2021

267: Limbu, T. B.; Adhikari, B.; Song, S.K.; Chitara, B.; Tang, Y. G.; Parsons, G. N.; Yan, F.

Toward understanding the phase-selective growth mechanism of films and geometrically-shaped flakes of 2D MoTe2

RSC Adv. 2021 
DOI: 10.1039/d1ra07787b

266: Nye, R.A.; Wang, S. Y.; Uhlenbrock, S.; Smythe, J. A; Parsons, G.

In situ analysis of growth rate evolution during molecular layer deposition of ultra-thin polyurea films using aliphatic and aromatic precursors

Dalton Trans. 2021 
DOI: 10.1039/d1dt03689k

 

265: Kim, J. S.; Parsons, G.N.

Nanopatterned Area-Selective Vapor Deposition of PEDOT on SiO2 vs Si-H: Improved Selectivity Using Chemical Vapor Deposition vs Molecular Layer Deposition

Chem Mater. 2021
DOI: 10.1021/acs.chemmater.1c02842

264: Lee, D. T.; Zijian, D.; Peterson, G. W.; Hall, M. G.; Pomerantz, N. L.; Hoffman, N.; Parsons, G. N.; Jones, J. L.

Highly Breathable Chemically-Protective MOF-Fiber Catalysts

Adv. Funct. Mater. 2021
DOI: 10.1002/adfm.202108004

263: Dai, Z. J.; Pradeep, S.; Zhu, J.; Xie, W. Y.; Barton, H.F.; Si, Y.; Ding, B.; Yu, J. Y.; Parsons, G. N.

Freestanding Metal Organic Framework-Based Multifunctional Membranes Fabricated via Pseudomorphic Replication toward Liquid- and Gas-Hazards Abatement

Adv. Mater. Interfaces. 2021 
DOI: 10.1002/admi.202101178

262: Song, S.K.; Kim, J.; Margavio, H.; Parsons, G.N.

Multi-Material Self-Aligned Nano-Patterning by Simultaneous Adjacent Thin Film Deposition and Etching

ACS Nano. 2021
DOI: 10.1021/acsnano.1c04086

261: Chen, I.T; Dai, Z.J.; Chen, Y. A.; Parsons, G. N.; Chang, C. H.Fabrication of Non-Uniform Nanolattices with Spatially Varying Geometry and Material Composition 

Adv. Mater. Interfaces. 2021 
DOI: 10.1002/admi.202100690

260: Morgan, S.; O’Connell, A.; Jansson, A.; Peterson, G.; Mahle, J.; Eldred, T.; Gao, W.; Parsons, G. N.

Stretchable and multi-MOF fabrics via high-yield rapid sorption-vapor synthesis, and application to chemical warfare agent hydrolysis

ACS Appl. Mater. Interfaces. 2021 
DOI: 10.1021/acsami.1c07366

259: Volk, A. A.; Kim, J. S.; Jamir, J.; Dickey, E. C.; Parsons, G. N. Oxidative molecular layer deposition of PEDOT using volatile antimony(V) chloride oxidant

J. Vac. Sci. Technol. 2021 
DOI: 10.1116/6.0000791

258: Peterson, G. W.; Lee, D. T.; Barton, H. F.; Epps, T. H.; Parsons, G. N.

Fibre-based composites from the integration of metal-organic frameworks and polymers

Nat. Rev. Mater. 2021 
DOI: 10.1038/s41578-021-00291-2

257: Lee, Y.; Hsain, H. A.; Fields, S.S.; Jaszewski, S. T.; Horgan, M. D.; Edgington, P.G.; Ihlefeld, J.F.; Parsons, G. N.; Jones, J. L.

Unexpectedly large remanent polarization of Hf0.5Zr0.5O2 metal-ferroelectric-metal capacitor fabricated without breaking vacuum

Appl. Phys. Lett. 2021 
DOI: 10.1063/5.0029532

256: Barton, H. F.; Jamir, J. D.; Davis, A. K.; Peterson, G. W.; Parsons, G. N.

Doubly Protective MOF-Photo-Fabrics: Facile Template-Free Synthesis of PCN-222-Textiles Enables Rapid Hydrolysis, Photo-Hydrolysis and Selective Oxidation of Multiple Chemical Warfare Agents and Simulants

Eur. J. Chem.. 2021 
DOI: 10.1002/chem.202003716

2020

255: Dai, Z.; Zhu, J.; Yan, J.; Su, J.; Gao, Y.;  Zhang, X.; Ke, Q.; Parsons, G. N.

An Advanced Dual‐Function MnO2‐Fabric Air Filter Combining Catalytic Oxidation of Formaldehyde and High‐Efficiency Fine Particulate Matter Removal

Adv. Funct. Mater. 2020 

DOI:10.1002/adfm.202001488

254: Saare, H.; Song, S.K.; Kim, J.; Parsons, G.N.

Effect of Reactant Dosing on Selectivity during Area-Selective Deposition of TiO2 via Integrated Atomic Layer Deposition and Atomic Layer Etching

J. Appl. Phys. 2020
DOI: 10.1063/5.0013552

Scheme 1 253: Wang, S.; Pomerantz, N. L.; Dai, Z.; Xie, W.; Anderson, E. E.; Miller, T.; Khan, S. A.; Parsons, G. N.

Polymer of intrinsic microporosity (PIM) based fibrous mat: combining particle filtration and rapid catalytic hydrolysis of chemical warfare agent simulants into a highly sorptive, breathable, and mechanically robust fiber matrix

Mater Today Adv 2020 
DOI: 10.1016/j.mtadv.2020.100085

Abstract Image 252: Parsons, G. N.; Clark, R.D.

Area Selective Deposition: Fundamentals, Applications and Future Outlook

Chem. Mater. 2020 
DOI: 10.1021/acs.chemmater.0c00722

Abstract Image 251: Wang, S.; Shi, K.; Tripathi, A.; Chakraborty, U.; Parsons, G. N.; Khan, S.

Designing Intrinsically Microporous Polymer (PIM-1) Microfibers with Tunable Morphology and Porosity via Controlling Solvent/Nonsolvent/Polymer Interactions

ACS Appl. Polym. Mater. 2020 
DOI: 10.1021/acsapm.0c00386

250: Hsain, H. A.; Lee, Y.; Parsons, G.; Jones, J. L.

Compositional dependence of crystallization temperatures and phase evolution in hafnia-zirconia (HfxZr1−x)O2 thin films

Appl. Phys. Lett. 2020 
DOI: 10.1063/5.0002835

Abstract Image 249: Barton, H.F.; Davis, A.; Parsons, G. N.

The effect of surface hydroxylation on MOF formation on ALD metal oxides:  MOF-525 on TiO2/polypropylene for catalytic hydrolysis of chemical warfare agent simulants

ACS Appl Mater Interfaces. 2020 
DOI: 10.1021/acsami.9b20910

248: Xie, Wenyi; Parsons, G. N.

Thermal atomic layer etching of metallic tungsten via oxidation and etch reaction mechanism using Oor Ofor oxidation and WCl6 as the chlorinating etchant

J. Vac. Sci. Technol. A 2020 
DOI: 10.1116/1.5134430

Abstract Image 247: Nye, R. A.; Kelliher, A.; Gaskins, J.; Hopkins, P.; Parsons, G. N.
Understanding Molecular Layer Deposition Growth Mechanisms in Polyurea via Picosecond Acoustics AnalysisChem. Mater. 2020 DOI: 10.1021/acs.chemmater.9b0472
Graphical abstract: Fabrication of a freestanding metal organic framework predominant hollow fiber mat and its potential applications in gas separation and catalysis 246: Dai, Z.; Lee, D. T.; Shi, K.; Wang, S.; Barton, H. F.; Zhu, J.; Yan, J.; Ke, Q.; Parsons, G. N.

Fabrication of Freestanding Metal Organic Framework Predominant Hollow Fiber Mat and Its Potential Applications in Gas Separation and Catalysis

J. Mater. Chem. A. 2020 
DOI: 10.1039/C9TA11701F

245: Lee, D. T.; Parsons, G. N.

Protective Fabrics: Metal-Organic Framework Textiles for Rapid Photocatalytic Sulfur Mustard Simulant Detoxification

Matter 2019 
DOI: 10.1016/j.matt.2019.11.005